Sino-German Workshop: optical spectroscopy of van der Waals semiconductor materials at Xiamen University

中德研讨会：范德华半导体材料光谱学（第一届）在厦门大学召开

The Sino-German workshop: van der Waals semiconductor spectroscopy was held from October 8 to 10 at the Science and Art Center of Xiamen University, Siming Campus. The meeting was co-chaired by Prof. Kaiqiang Lin and Prof. Bin Ren from Xiamen University and Prof. John Lupton from University of Regensburg, Germany, and hosted by the State Key Laboratory of Physical Chemistry of Solid Surfaces and the School of Chemistry and Chemical Engineering of Xiamen University. There were 34 professors and scholars (15 foreign scholars and 19 domestic scholars) from 15 institutions attending the meeting and giving presentations.  

The symposium was organized with the principle of "small and focused", with 18 invited presentations, 5 flash presentations and 9 poster presentations. With the topic of "optical spectroscopy of van der Waals semiconductor materials", the meeting exchanged the latest international research progresses in the optical spectroscopy of van der Waals semiconductor materials, discussed the key scientific questions in the community of van der Waals semiconductor materials, as well as the challenges and opportunities of spectroscopic characterization. The direction of the future development and potential in the field were discussed with a goal of strengthening the collaboration and promoting the development of the field.